AcXys Technologies developed ULCoat : thin layer deposition made easy – countless applications

ULCoat

By injecting a precursor into the plasma  post-discharge, ULCoat deposits thin layers onto the treated surface.

ULCoat is a system that vaporizes and injects a precursor under the plasma nozzle. The ULCoat is used coupled with an OMEGA ULS generator.

The standard unit has been designed to deposit SiOx using a metal-organic precursor. However, other recipes can be developed upon request.

AcXys Technologies’ process development lab is at your service to develop the application that meets your needs under a research and development contract.

ULCoat is available as a standalone equipment or as OEM.

ULCoat technology

• – Coupled to ULS OMEGA module
• – Used for thin layers deposition
• – Adjustable thickness from 50 to 1000 nanometers
• – Even thickness with +/- 2% variation
• – Processing speed for treatment up to 200 nm.cm2 / s
• – Standard version is optimized for SiOx deposits

Injection nozzle

Precursor flow is monitored prior to its injection into plasma. This module combines the following elements:

• – Precursor tank
• – Precursor flow control
• – Gas flow control
• – Heating component (optional)